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Keywords: rapid thermal processing
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Journal Articles
Article Type: Technical Papers
J. Heat Transfer. January 2007, 129(1): 79–90.
Published Online: June 8, 2006
...Y.-B. Chen; Z. M. Zhang; P. J. Timans Temperature nonuniformity is a critical problem in rapid thermal processing (RTP) of wafers because it leads to uneven diffusion of implanted dopants and introduces thermal stress. One cause of the problem is nonuniform absorption of thermal radiation...
Journal Articles
Article Type: Research Papers
J. Heat Transfer. February 2006, 128(2): 132–141.
Published Online: July 28, 2005
...David J. Frankman; Brent W. Webb; Matthew R. Jones A major obstacle to the widespread implementation of rapid thermal processing (RTP) is the challenge of wafer temperature measurement. Frequently, lightpipe radiation thermometers are used to measure wafer temperatures in RTP reactors. While...
Journal Articles
Article Type: Technical Papers
J. Heat Transfer. June 2003, 125(3): 462–470.
Published Online: May 20, 2003
...Y. H. Zhou; Z. M. Zhang This paper presents a Monte Carlo model for prediction of the radiative properties of semitransparent silicon wafers with rough surfaces. This research was motivated by the need of accurate temperature measurement in rapid thermal processing (RTP) systems. The methods...
Journal Articles
Article Type: Technical Papers
J. Heat Transfer. June 2002, 124(3): 564–570.
Published Online: May 10, 2002
.... The uncertainty in the RLS gas temperature measurements is discussed in detail by Horton and Peterson 21 22 , and was estimated at ±2−4 °C. Fair, R. B., 1993, Rapid Thermal Processing , Academic Press, San Diego, CA. Coltrin , M...