... 08 03 2006 copper silicon metallic thin films elemental semiconductors slurries chemical mechanical polishing lubrication wear surface roughness abrasives During the chemical mechanical polishing (CMP) process, a rotating wafer is pressed against a rotating, resilient...

... 24, 2003; revised manuscript received January 15, 2004. Associate Editor: M. Fillon. 24 June 2003 15 January 2004 13 06 2005 antimony alloys lead alloys metallic thin films polymer films machine bearings wear resistant coatings liquid films hydrodynamics wear testing...

...). 24 November 2003 11 March 2004 09 11 2004 copper metallic thin films indentation internal stresses plastic flow microhardness digital simulation finite element analysis Nanoindentatoin Finite Element Methods Nanohardness It is known that the mechanical...

..., it is extremely important that the tip geometry and area function are known precisely, and they can be obtained based on an “area calibration method,” described next. aluminium alloys metallic thin films nanostructured materials crystal microstructure wear elastic moduli hardness rough surfaces...

... copper chemical mechanical polishing Young's modulus elastic deformation plastic deformation abrasion lubrication tribology surface topography rough surfaces silicon elemental semiconductors metallisation indentation sliding friction planarisation metallic thin films Chemical...

...: C.-P. R. Ku. 29 August 2002 25 February 2003 25 09 2003 foils damping rolling friction machine bearings hysteresis modelling hydrodynamics metallic thin films Determination of frictional forces continue to be one of the most challenging aspects of research...

... surfaces mechanical contact friction elastoplasticity metallic thin films It is well recognized that friction can be reduced by a solid surface film between contacting bodies. Friction, as a function of film thickness for a steel slider on indium coated steel surfaces, was first studied...